Temperature Control System with Multiclosed Loops for Lithography Projection Lens

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1、万方数据CHINESEJOURNALOFMECHANICALENGINEERINGV01．22，No．2，2009·207·IX)I：10．3901／CJME．2009．02．207，availableonlineatwww．ejmeneLeom；WWW．cjmenet．eOlnCllTemperatureControlSystemwithMulti-dosedLoopsforLithographyProjedionLensMEHongfeil，LIXiaopin91一，andHEyan21Sta

2、teKeyLaboratoryofDigitalManufacturingEquipment＆Technology,HuazhongUniversity．．ofScienceandTechnology,Wuhan430074，China。2TianhuaCollege，ShanghaiNormalUniversity，Shanghai201815，ChhtaReceivedMay27，2008；revisedJanuary8，2009；acceptedJanuary22，2009；publishe

3、delectronicallyFebruary6，2009Abstract：ImagequalityisOneofthemostimportantspecificationsofopticalfithographytoolandisaffectednotablybytemperature，vibration．andcontaminationofprojectionlens(PL)．Tradifionalmethodoflocaltemperatureconffoliseasiertointrodu

4、cevibrationandcontaminatioil。sotemperamrecontrolsystemwithmulti-closedloopsisdevelopedtocontrolthetemperatureinsidethePL，andtoisolatetheinfluenceofvibrationandcontamination．Ailewremoteindirect．temperature-control(RITC)methodisproposedinwhichcoolingwat

5、eriscirculatedtoperformindirect-temperature-controlofthePL．HeaterandcoolerembeddedtemperaturecontrolnniKTCU)isusedtoeonditionthetemperatureofthecoolingwatex，andtheTCUmustbekeptawayfromthePLsothattheinfluenceofvibrationandcontaminationcanbeavoided．Ausm

6、ulti-closedloopscontrolstructureincorporatinganinternalcascadecontrolstmcture(CCS)andanexternalparallelcascadecontrolstructure(PCCS)isdesignedtOpreventlargeinertia，multi-delay，andmulti-disturbanceoftheRITCsystem．Anonlinearproportional-integral(Pnalgor

7、ithmisappliedtofurtherellhallcetheconvergencerateandprecisionofthecontrolprocess，Contrastexperimentsofdifferentcontrolloopsandalgorithinswereimplementedtoveilfytheimpactonthecontrolperformance．Itisshownthatthetemperaturecontrolsystemwithmulti-closedlo

8、opsreachesaprecisionspecificationati-0．006℃withfastconvergencerate，strongrobustness，andself-adaptabili哆．删smethodhasbeensuccessfullyusedinanopticallithographytoolwhichproducesapatternof100nmcriticaldimeusion(CD)，anditsperformancesaresatisfactor