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1、GENERALMOTORSENGINEERINGSTANDARDSMEASURINGTHICKNESSOFELECTRODEPOSITSANDANODICCOATINGSGM4260P1GENERALThreecommonlyusedmethodsformeasur-depositsbelow0.2mil(exceptforgroundsurfaces),andtheingthethicknessofelectrodepositsandanodiccoatingsareMass-Area(orChemical)Method(exceptf
2、orzincbasediedescribed;andreferenceismadetosixadditionalmethods.castings)arenormallypreferred.These,andtheotherUnlessotherwiseindicated,anymethodmaybeusedwhenmethodslisted,areconsideredtobesufficientlyaccurateforGM4260Pisspecified.Thechoiceofmethoddependsuponroutineproduc
3、tiontestingwhenusedaccordingtothetheprecisiondesiredandthefeasibilityofapplicationtoinstructionsreferenced.productionparts.Whererefereecheckingisrequired,theMicroscopicMethodSomemethodsrequirecalibrationstandards,whicharefordepositsabove0.1mil,theInterferometryMethodforav
4、ailablecommerciallyorcanbereadilyprepared.ThlCkllt!SSInstrumentsReferencetoAdditionalMethodApplicableForRfweAvailableInformationbm)1.MICROSCOPICMETHOD.“MicroscopicMethod”Allcommonlyused2.5-254(Mag-Destructive.Samplesarecut,Metallographic:&etextfollowingthistable)metalsand
5、anodicnificationovermounted,polished,andetchedac-microscopewith2.MetalFinishingGuide-:oatingsonalumi-500Xmaylow-cordingtostandardmetallographicfilareyepiecebook(Page597,1961issue)numerthemin)procedures.3.ASTMA2192.INTERFEROMETRYMETH-OD.Destructive.Destructiveforchromiuman
6、donemethodforanodiccoatingsonaluminumwhenmeasuredasforchromium;1.“InterferometryMethod”nondestructiveforanodiccoatingsChromium0.05-5.1(Seetextfollowingthistable)ZeissInterfer-onaluminum(seeref2atright).Anodiccoatingson0.003-5.12.Plating,42,55,(1955)enceMicroscopeMeasureme
7、ntsofsurfaceelevation!aluminum(ref3)3.Plating,44,1079,(1957)aremadebyopticalinterference.Q.Plating,45,1232,(1958)Theverticaldistance(coatingthickness)betweenthesubstrate--`````````,,`,``,,,``,`,``,,`-`-`,,`,,`,`,,`---surfaceandthecoatingsurfaceismeasured.3.WEIGHT-AREA(CHE
8、MI-CAL)METHOD.Destructive.AreaofsampleismeasuredandAllcommonlyused1.“Weight-AreaMethod”dissolved
