资源描述：
《Atomic Layer Deposition for the Conformal Coating ofNanoporous Materials》由会员上传分享，免费在线阅读，更多相关内容在学术论文-天天文库。
1、HindawiPublishingCorporationJournalofNanomaterialsVolume2006,ArticleID64501,Pages15DOI10.1155/JNM/2006/64501AtomicLayerDepositionfortheConformalCoatingofNanoporousMaterialsJeffreyW.Elam,1GuangXiong,2CatherineY.Han,2H.HauWang,2JamesP.Birrell,2UlrichWelp,2JohnN.Hryn,1MichaelJ.Pellin
2、,2TheodoreF.Baumann,3JohnF.Poco,3andJoeH.SatcherJr.31EnergySystemsDivision,ArgonneNationalLaboratory,Argonne,IL60439,USA2MaterialsScienceDivision,ArgonneNationalLaboratory,Argonne,IL60439,USA3ChemistryandMaterialsScienceDirectorate,LawrenceLivermoreNationalLaboratory,Livermore,CA9
3、4550,USAReceived15March2006;Revised9May2006;Accepted10May2006Atomiclayerdeposition(ALD)isidealforapplyingpreciseandconformalcoatingsovernanoporousmaterials.WehaverecentlyusedALDtocoattwonanoporoussolids:anodicaluminumoxide(AAO)andsilicaaerogels.AAOpossesseshexagonallyorderedporesw
4、ithdiametersd∼40nmandporelengthL∼70microns.TheAAOmembraneswerecoatedbyALDtofabricatecatalyticmembranesthatdemonstrateremarkableselectivityintheoxidativedehydrogenationofcyclohexane.AdditionalAAOmembranescoatedwithALDPdfilmsshowpromiseashydrogensensors.Silicaaerogelshavethelowestden
5、sityandhighestsurfaceareaofanysolidmaterial.Consequently,thesematerialsserveasanexcellentsubstratetofabricatenovelcatalyticmaterialsandgassensorsbyALD.Copyright©2006JeffreyW.Elametal.ThisisanopenaccessarticledistributedundertheCreativeCommonsAttributionLicense,whichpermitsunrestric
6、teduse,distribution,andreproductioninanymedium,providedtheoriginalworkisproperlycited.1.INTRODUCTIONtrimethylaluminum(Al(CH3)3,TMA)todepositamono-layerofaluminum-methylgroupsandgiveoffmethaneAtomiclayerdeposition(ALD)isathinfilmgrowthtech-(CH4)asabyproduct.BecauseTMAisinerttothemeth
7、yl-niquethatusesalternatingandsaturatingreactionsbetweenterminatedsurface,furtherexposuretoTMAyieldsnoad-gaseousprecursormoleculesandasubstratetodepositfilmsditionalgrowthbeyondonemonolayer.Inreaction(B),inalayer-by-layerfashion[1,2].Byrepeatingthisreac-thisnewsurfaceisexposedtowat
8、erregeneratingtheinitialtionseque
