基于su-8光刻胶的微透镜及阵列的研究

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1、万方数据摘要II万方数据AbstractWiththedevelopmentofMOEMS(Micro-Optical—Electro—MechanicalSystem)，thedemandforminiaturizationoftheopticalelementisincreasing．Aslensisoneofthemostcrucialelementoftheopticalsystem，miniaturizationofthelenshasbecometheresearchfocus．Inrecentyears，manyresearchinstitutionsanduniversit

2、ieshavebeenconductingtheresearchaboutthemicrolensandmanymicrolensfabricationmethodshavebeenproposed．Amongthem，thephotoresistreflowmethodhasbecomethefocusofmanyresearchers’study．BasedonthedeepultrauialeLlithography，anewphotoresistfabricationmethodisproposedinthisthesis．Themicrolensarrayswerefabrica

3、tedbasedonsurfacetensionwhenheatingtemperatureisoverglasstransitiontemperatureofSU-8photoresist．Themaincontentsofthisthesisaresunmaafizedasfollows：1．Themicrolensfabricationmethodswereresearchedandanalyzedandthedomesticandforeignresearchstatusandprogressofmicrolensfabricationmethodswereinvestigated

4、．TheSU-8resistfabricationprocesshasbeenstudied．Basedontheconventionalphotoresistreflowmethod，anewmethodforfabricatingthemicrolenshasbeenproposedinthisthesis．Thetheoreticalanalysisoftheformationmechanismofmicrolenshasbeenconducted．Theoretically，theinfluencefactorstocontrolthemorphologyofthemicrolen

5、swerediscussed．Thefabricationprocesstoleranceandconsistencywereanalyzed．Basedontheproposedphotoresistfabricationmethod，severalexperimentshavebeenmadetoexploreandstudytheeffectofvariousprocessparametersonthemorphologyofthemicrolens．2．Themorphologyofthemicrolenswasmeasuredbythreemeasuremethods．Theme

6、asuremethodswerewiththesurfaceprofiler，opticalmicroscopy／scanningelectronmicroscopyandthebuiltupopticalsetup，respectively．Accordingtoalargeamotmtofexperimentaldata，theeffectofvariousprocessparametersonthemorphologyofthemicrolenshasbeenanalyzed．Theeffectofthewidthofphotoresistmicrostructure，theheig

7、htofcoatingphotoresist，post-bakingprocedureonthemorphologyofmicrolenshavebeendiscussedandanalyzed．Thefocallengthofmicrolenswereobtainedbytwomethodsandtheopticalperformancehasbeenanalyzedandevaluated．Finally，thefi