Preparation of Silicon Wafers.pdf

Preparation of Silicon Wafers.pdf

ID:34974556

大小:928.47 KB

页数:27页

时间:2019-03-15

Preparation of Silicon Wafers.pdf_第1页
Preparation of Silicon Wafers.pdf_第2页
Preparation of Silicon Wafers.pdf_第3页
Preparation of Silicon Wafers.pdf_第4页
Preparation of Silicon Wafers.pdf_第5页
资源描述:

《Preparation of Silicon Wafers.pdf》由会员上传分享,免费在线阅读,更多相关内容在学术论文-天天文库

1、PreparationofSiliconWafersCrystalGrowth長晶Granular(顆粒)polysiliconinmeltphaseRawMaterial:融化(polysilicon)原始材料Chunk(塊狀)polysiliconinmeltphaseSeed(晶種)andIngot(晶錠)CrystalPulling拉晶FinishedIngot晶錠完成Crystaltrimming(修整)and修整與研磨diametergrind(研磨)Flatgrinding平口端之研磨ZonerefiningEdgeRounding(變圓)Slicing(切片)Lappin

2、g(細研磨)LappingWaferEtching(蝕刻)Polishing(拋光)Polishing(拋光)EpitaxialGrowth磊晶EpitaxialLayer(磊晶層)EpitaxialGrowth磊晶EpitaxialLayerSi99.9999999999%SubstrateSi99.9999999%WaferIdentifyingFlatsMethodsforEpitaxial(磊晶)Growth磊晶的方法1.ChemicalVaporDeposition(CVD;化學氣相沈積法):siliconbased,germaniumbased,2.MolecularBeam

3、Epitaxy(MBE;分子磊晶法):GaAsbased,ChemicalVaporDeposition(CVD)SiH4(1)GastransportgasgasSiH4H2(2)PrecursorsSiH4SiH2H2(byproduct)SiH2SiH4Si2H6(precursors)substrateHeater200~300°CCVDMethodChemicalVaporDeposition(CVD)SiH4(1)Gastransportgasgas(3)PrecursorsatwafersubstrateHeater200~300°CCVDMethodChemic

4、alVaporDeposition(CVD)SiH4(1)Gastransportgasgas(4)Precursorsadsorption(5)PrecursorsdiffusionsubstrateHeater200~300°CCVDMethodChemicalVaporDeposition(CVD)SiH4(1)Gastransportgasgas(6)SurfacereactionssubstrateHeater200~300°CCVDMethodChemicalVaporDeposition(CVD)SiH4(1)GastransportgasgasH2(7)By-produc

5、tremovalfromsurfaceSisubstrateHeater200~300°CCVDMethod補充:Silicon矽Si,Silica二氧化矽SiO2Silicon矽substrateHeater200~300°CCVDMethodChemicalVaporDeposition(CVD)1.Gastransporttodepositionzone:Masstransportofgasinthemaingasflowregionfromthereactorinlet(入口)tothedepositionzoneofthewafer.2.Formationoffilmprecu

6、rsors(先前物):Gas-phasereactionsleadingtotheformationofthefilmprecursorsandby-product(副產品).3.Filmprecursoratwafer:Masstransportofthefilmprecursorstothewafergrowthsurface.4.Precursorsadsorption(吸附):Adsorption(binding)offilmprecursortothesurface.ChemicalVaporDeposition(CVD)5.Precursorsdiffusion:Surfac

7、ediffusionoffilmprecursortothefilmgrowthsites.6.Surfacereactions:Surfacechemicalreactionsleadingtofilmdepositionandby-products.7.By-productremovalfromsurface:Desorption(吸解)(removal)oftheby-productsofthesurfacereactions

当前文档最多预览五页,下载文档查看全文

此文档下载收益归作者所有

当前文档最多预览五页,下载文档查看全文
温馨提示:
1. 部分包含数学公式或PPT动画的文件,查看预览时可能会显示错乱或异常,文件下载后无此问题,请放心下载。
2. 本文档由用户上传,版权归属用户,天天文库负责整理代发布。如果您对本文档版权有争议请及时联系客服。
3. 下载前请仔细阅读文档内容,确认文档内容符合您的需求后进行下载,若出现内容与标题不符可向本站投诉处理。
4. 下载文档时可能由于网络波动等原因无法下载或下载错误,付费完成后未能成功下载的用户请联系客服处理。