磁控溅射专业词汇

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1、TCO磁控溅射专业词汇TCO（Transparentconductiveoxide）玻璃，即透明导电氧化物镀膜玻璃，是在平板玻璃表面通过物理或者化学镀膜的方法均匀镀上一层透明的导电氧化物薄膜。AZOZnO：Al（Al-dopedZnO，Aluminum-dopedzincoxide）氧化铟锡ITOIndium-Tin-OxideIn2O3：SnO2氧化锡掺氟FTOSnO2：F其中AZO，ITO，FTO均为TCO的一种。磁控溅射Magnetronsputtering中频MFMid-frequency直流

2、DCDirectcurrent交流ACAlternatingcurrent射频RFRadiofrequency物理气相沉积PVDPhysicalVaporDeposition化学气相沉积CVDChemicalVaporDeposition等离子体增强化学气相沉积PECVDPlasmaenhancedCVD双平面阴极DoubleplanarCathode孪生阴极Twin-MagCathode旋转阴极RotatableCathodeAZO陶瓷靶AZOceramictarget高纯度靶highpurityt

3、arget透过率transmittance反射率reflectivity吸收率absorbtivity空气质量AMairmass面电阻sheetresistance辉光放电glowdischarge起辉电压dischargevoltage打弧arcing离子轰击ionbombardment靶中毒targetpoisoning载流子浓度carrierconcentration霍耳迁移率Hallmobility电阻率specificresistivity四探针（测量面电阻）Four-point-probe

4、托架carrier装片台Loadlocking进口室Entrancechamber加热室Heatingchamber传送室transferchamber溅射室sputterchamber冷却室Coolingchamber出口室Exitchamber冷却系统coolingsystem抽气系统pumpingsystem排气装置exhaust阻挡层Barrierfilm透明电极Transparentelectrode工艺气体ProcessGas衬底温度SubstrateTemperature溅射功率Sput

5、terpower功率密度Powerdensity动态沉积速率dynamicdepositionrate/dynamicsputteringspeed预溅射presputtering溅射速率Sputterrate靶材利用率targetutilization靶材寿命targetlifetime洛伦兹力Lorentzforce磁场强度Magneticfieldstrength惰性气体Noblegas（ArArgon）生产速率growingspeed薄膜结构filmstructure热电偶thermocoup

6、le靶材冷却targetcooling本底真空basepressure粗真空roughvacuum1.01×105～1.33×103Pa高真空highvacuum1.33×10-1～1.33×10-6Pa超高真空ultrahighvacuum1.33×10-6～1.33×10-10Pa0.5%盐酸dilutedhydrochloricacid刻蚀etching在线中频磁控反应溅射in-linereactiveMFmagnetronsputtering晶粒尺寸Grainsize阳极，正极node阴极，负

7、极Cathode阴极防蚀CathodicProtection冷阴极真空规MPG薄膜电容规CDG质量流量计MFCmassflowcontroller螺杆泵ScrewPump旋片泵RotaryVanePump罗茨泵RootsPump分子泵TurbomolecularPump漏率leakrate压缩空气compressedair节拍cycletime锁阀Lockvalve泵组PumpUnit单晶硅Monocrystalsilicon晶体硅C-Si,crystalline-silicon微晶硅microcry

8、stalsilicon非晶硅amorphoussilicona-Si:H碲化镉CdTeCadmium-Tellurid铜铟镓硒CIGSCopperIndiumGalliumDiselenideCISCopper-Indium-Diselenide砷化镓GaAsGallliumArsenid太阳能薄膜电池thinfilmsolarcell非晶硅太阳电池（a—si太阳电池）amorphoussiliconsolarcell附着力（薄膜与基体间）adhesio