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1、AtomicLayerDeposition(ALD)杨超、包峰、方聪、蒋博瀚、马红石李勇辉、王谦、徐晨、于浩、赵灿灿—ShanghaiInstituteofCeramicsSyntheticChemistryofMaterialsOutlineOutline1.IntroductiontoALD2.Classicalmodels:ALDofAl2O33.ALDandCVD4.ApplicationsofALD(1)Coatingsonhighaspectratiostructures(2)CoatingsonNanoparticles(3)CombinationofCNT(4)Plasm
2、aALD5.ExpectationsandchallengeinALD2.Classicalmodels:ALDofAl2O3TheoverallreactionforAl2O3ALD2Al(CH3)3+3H2OAl2O3+3CH4∆H=376kcalThesurfacechemistryduringAl2O3ALD(a)AlOH*+Al(CH3)3AlOAl(CH3)2*+CH4(b)AlCH3*+H2OAlOH*+CH4Characters5Highrepeatabilityandexpansibility6Substrate（Largeandhighaspectratio）4Pin
3、hole-freefilms3Conformaldeposition2Self-limiting1Atomiclevelcontrol1.IntroductiontoALDAtomiclayerdeposition（ALD）—atomiclevelcontroloffilmdeposition3.ComparisonofALDandCVDSchematicpressureprofileduringtheALDandCVDprocessSeung-MoLeeetal.,ChemPhysChem,12,791-798(2011)3.ComparisonofALDandCVDSequentia
4、lintroductionofprecursorsSynchronousintroductionofprecursorsALDCVDBetterstepcoverageExistingshadowingeffectsAtomiclevelcontrolIcan’t12M.Knaut,etal.MicroelectronEng,107,80-83(2013)4.1CoatingsonhighaspectratiostructuresCoatingonstep-likesructures1Coatingonmulti-porestructures24.2Coatingsonnanoparti
5、clesPSspheresselfassembledALDofTiCl4andH2OIonmillingEtching PS hemispheresAnnealingXuDongWangetal.,NanolettersVol.4,No.11(2004)4.2CoatingsonnanoparticlesALD Cycles→Bowl ThicknessPSSpheres→BowlSize4.3CombinationofCNTandsuper-blackcoatingsSchematicillustrationoftheALDandCVDprocessforthesynthesisofC
6、NTarraysSchematicrepresentationofAl2O3ALDcoatingonmonodispersedNPs.4.3CombinationofCNTandsuper-blackcoatingsKaiZhou,etal.,NanoscaleResLett,5:1555-1560(2010)XinWang,etal.,ACSAppl.Mater.Interfaces,3:4180-4184(2011)Improvedmaterialpropertiesfilmdensity,impuritycontent,electronicpropertiesDepositiona
7、treducedsubstratetemperaturesIncreasedchoiceofprecursorsandmaterialsGoodcontrolofstoichiometryandcompositionoperatingpressure,power,exposuretime,biasingvoltageIncreasedgrowthrate4.4MeritsofPlasma-AssistedALDN.Leick,J.V
