nl3036977-从石墨烯刻蚀法制备石墨烯量子点

nl3036977-从石墨烯刻蚀法制备石墨烯量子点

ID:43808821

大小:240.03 KB

页数:5页

时间:2019-10-14

nl3036977-从石墨烯刻蚀法制备石墨烯量子点_第1页
nl3036977-从石墨烯刻蚀法制备石墨烯量子点_第2页
nl3036977-从石墨烯刻蚀法制备石墨烯量子点_第3页
nl3036977-从石墨烯刻蚀法制备石墨烯量子点_第4页
nl3036977-从石墨烯刻蚀法制备石墨烯量子点_第5页
资源描述:

《nl3036977-从石墨烯刻蚀法制备石墨烯量子点》由会员上传分享,免费在线阅读,更多相关内容在应用文档-天天文库

1、Letterpubs.acs.org/NanoLettQuantumDotsatRoomTemperatureCarvedoutfromFew-LayerGraphene,†,‡††AmeliaBarreiro,*HerreS.J.vanderZant,andLievenM.K.Vandersypen†KavliInstituteofNanoscience,DelftUniversityofTechnology,Lorentzweg1,2628CJDelft,TheNetherlands‡DepartmentofPhysics,ColumbiaUniversity,NewYork,NewY

2、ork10027,UnitedStates*SSupportingInformationABSTRACT:Wepresentgraphenequantumdotsendowedwithadditionenergiesaslargeas1.6eV,fabricatedbythecontrolledruptureofagraphenesheetsubjectedtoalargeelectroncurrentinair.Thesizeofthequantumdotislandsisestimatedtobeinthe1nmrange.Thelargeadditionenergiesallowfo

3、rCoulombblockadeatroomtemperature,withpossibleapplicationtosingle-electrondevices.KEYWORDS:Graphene,quantumdots,quantumtransport,single-electrontransistors,moleculartransportrapheneisaone-atom-thickplanarsheetofsp2-bondedcanbeaslargeas1.6eV.TheirformationreliesontheGcarbonatomswhoseshapecanbestruc

4、turedbymeansofcontrolledruptureofafew-layergraphenesheetsubjectedtoastandardtop-downfabricationtechniques,representingalargeelectroncurrent.Simpleestimatesshowthatthesizeofsimpleandscalableapproachtorealizeelectronicdevices.thecharge-carrierislandofthesequantumdotsliesinthe1nmIndeed,oneofthemostap

5、pealingresearchdirectionsinvolvingrange.grapheneisitsuseasthebasematerialforelectroniccircuitryWestartbybrieflydescribingourfabricationtechnique.Few-1,2layergrapheneflakes(between3and18nmthick)arethatisenvisagedtoconsistofnanometer-sizedelements.Forthispurpose,graphenenanoribbonshavecapturedwidespre

6、addepositedbymechanicalexfoliationofkishgraphite(Toshiba3−11Ceramics)ondegeneratelydopedsiliconsubstratescoatedwithattention.Also,quantumdot(QD)devicesmadeentirelyfromgrapheneareconsidered,withpossibleapplicationsto280nmofthermalsiliconoxide.Fortheexfoliation,weuse12,13standardwaferprotectiontape,

7、asitleaveslittleadhesivesingle-electrontransistorsandsupersensitiveelectrometry.MostQDsreportedtodateoperateatcryogenictemper-residueonsubstrates.Electrodesarepatternedontopofatures,whichlimitstheiruseinapplicati

当前文档最多预览五页,下载文档查看全文

此文档下载收益归作者所有

当前文档最多预览五页,下载文档查看全文
温馨提示:
1. 部分包含数学公式或PPT动画的文件,查看预览时可能会显示错乱或异常,文件下载后无此问题,请放心下载。
2. 本文档由用户上传,版权归属用户,天天文库负责整理代发布。如果您对本文档版权有争议请及时联系客服。
3. 下载前请仔细阅读文档内容,确认文档内容符合您的需求后进行下载,若出现内容与标题不符可向本站投诉处理。
4. 下载文档时可能由于网络波动等原因无法下载或下载错误,付费完成后未能成功下载的用户请联系客服处理。