rena清洗制绒设备培训.ppt

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1、2011-5-1TrainingForRENARENA培训Overview/概述Part1:componentsoftherena/第一部分：RENA清洗机的组件Part2:turnontherena/第二部分：RENA的开机Part3:operatingsystem/第三部分：操作系统Part4:turnofftherena/第四部分：RENA的关机Part1ComponentsoftheRENARENA清洗机的组件•1InTex./InTex1台•2intermediatetransports(inputstation/outputstation)./进料台、出料台各1个•1c

2、hiller./冷却器1个•1electricalcabinet./电器柜1个•1InOxSide./InOxSide1台•2intermediatetransports(inputstation/outputstation)./进料台、出料台各1个•1chiller./冷却器1个•1electricalcabinet./电器柜1个intex/inOxSideChiller（冷却器）ElectricalCabinet（电器柜）ElectricalCabinetInside电器柜内部图Chemicalpipesandexhaustpipes化学品供应管和排风管CDAandDI-wate

3、rpipes压缩空气和纯水供应管Hotairsystem热风系统Generalinformation/概述InTexPurpose:washingthespeckandetchasuedeonthesurfaceofthewafers./目的:清洗硅片表面的污渍，并在硅片表面刻蚀出绒面。InOxSidePurpose:removethephosphorglassandthephosphorendowedsiliconfilmfromthebottomsurfaceandtheedgesofthewafers./目的:去除硅片表面的磷硅玻璃；去掉背面及四周的P-N结。Workingpr

4、ocess/工作流程EtchbathInputstationOutputstationACDRinse3AcidicRinseRinse2AlkalineRinseDryer1Rinse1InOxSideEtchbathInputstationOutputstationACDRinse3AcidicRinseRinse2Rinse1AlkalineRinseIntex工作流程制绒槽上料台下料台干燥漂洗3#酸洗漂洗2#碱洗吹干漂洗1#InOxSide刻蚀槽上料台下料台干燥漂洗3#酸洗漂洗2#漂洗1#碱洗IntexStations/各槽子位置图Stations•Station1-Etch

5、bath:Thewafersareetchedwithanacidmixture./槽1–制绒槽:用酸液在硅片表面刻蚀出绒面。•Station2-Rinse1:Thewafersareexemptfromthemediaofthepreviousstation./槽2–漂洗槽1:去除来自上一个槽子的化学品。•Station3-Alkalinecleanbath:Thewaferswillbealkalinerinsedtoavoidspecking./槽3–碱洗槽:用碱液清洗硅片表面的污渍。•Station4-Rinse2:Thewafersareexemptfromthemedia

6、ofthepreviousstation./槽4–漂洗槽2:去除来自上一个槽子的化学品。•Station5-Acidiccleanbath:Thewaferssurfacewillbetreatedwithanacidmixture./槽5–酸洗槽:用酸液清洗硅片表面。•Station6-Rinse3:Thewafersareexemptfromthemediaofthepreviousstation./槽6–漂洗槽3:去除来自上一个槽子的化学品。•Station7–AirChannelDryer:Inthelaststepthewafersareairdriedonbothside

7、s./槽7–空气干燥槽:在最后一步中,硅片的两面使用热空气吹风干燥.Part2TurnontheRENA第二部分RENA的开机Step1.CheckthemediasupplysuchasDI-water、CDA、HF、HNO3、HCl、KOHandsoon./检查气、水和化学品的外部供应。例如DI-water、CDA、HF、HNO3、HCl、KOH等等.InOxSideCheckingbeforepoweron/开机前检查CDACold-waterChe