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TiN薄膜的应力状态对摩擦学性能的影响Title:TheInfluenceofTiNThinFilm'sStressStatusonTribologicalPerformanceAbstract:TiN(TitaniumNitride)thinfilmwithexcellentmechanicalandtribologicalpropertieshasbeenwidelyusedinvariousindustrialapplications.However,asaresultofthedepositionprocess,residualstressesinevitablyexistinTiNfilms,whichmayadverselyaffectitstribologicalbehavior.ThispaperaimstoinvestigatetheeffectofTiNthinfilm'sstressstatusonitstribologicalperformance.TheresidualstressofTiNfilmswascontrolledbychangingthedepositionparameters,thenthetribologicaltestswereconductedusingaball-on-diskconfiguration.TheexperimentalresultsshowedthatTiNfilmswithcompressiveresidualstressexhibitedbettertribologicalperformancethanthosewithtensileresidualstress.Moreover,the
1interfacebetweentheTiNfilmandthesubstratewasidentifiedasthecriticalpositionwherecracksanddelaminationoccurred.Therefore,optimizingthedepositionparameterstoobtainTiNfilmswithcompressiveresidualstresswhilereducingtheinterfacestressisaneffectiveapproachtoachievingoptimaltribologicalperformance.Introduction:TiNthinfilm,asatypeofwear-resistantcoating,hasbeenwidelyusedinaerospace,automotive,andmedicalindustriesduetoitsexcellentmechanicalandtribologicalproperties.Afterbeingwidelyinvestigated,alotofresearchhasbeencarriedoutinordertounderstandthemechanicalandtribologicalpropertiesofTiNthinfilms.However,asaresultofthedepositionprocess,residualstressesinevitablyexistinTiNfilms,whichmayadverselyaffectitstribologicalbehavior.Stress,asamechanicalpropertyofmaterials,willaffectthe
2tribologicalbehaviorofcoatings.InexistingresearchonTiNthinfilms,stressisfoundtobeoneofthemostimportantfactorsthataffectsthetribologicalbehaviorofcoatings.Ithasbeenshownthatcompressiveresidualstresscanleadtoareductioninthewearrateandenhancetheadhesivestrength,whiletensileresidualstresswouldcauserapiddelamination,leadingtoasignificantdecreaseinwearresistance.Therefore,thispaperaimstoinvestigatetheinfluenceofTiNthinfilm'sstressstatusonitstribologicalperformance.ThestressinTiNfilmswascontrolledbychangingthedepositionparameters,andthenthetribologicaltestswereconductedusingaball-on-diskconfiguration.ExperimentalProcedure:TiNfilmsweredepositedonasiliconsubstrateusingaDCreactivemagnetronsputteringsystemwithdifferentdepositionparameters,includingthesputteringpressure,sputteringpower,
3andsubstratebiasvoltage.ThethicknessofTiNfilmswasapproximately500nm,andthedepositiontemperaturewaskeptat300°C.Afterdeposition,residualstressinTiNfilmswasmeasuredusingasurfaceprofilometerequippedwithastressanalyzer.Thetribologicaltestswereconductedonamicro-tribometerequippedwithaball-on-diskconfiguration.Astainlesssteelball(10mmindiameter)wasusedasthecounterface,andtheloadwaskeptconstantat5N.Theslidingspeedwassetat1cm/s,andthetotalslidingdistancewas5000m.Thefrictioncoefficientwasrecordedduringthetests,andtheweartrackmorphologywasanalyzedusingascanningelectronmicroscope(SEM).ResultsandDiscussion:TheresidualstressinTiNfilmswasfoundtobecloselyrelatedtothedepositionparameters.Withadecreaseofsputteringpowerorincreaseofsputteringpressure,theresidualstressinTiNfilms
4changedfromtensiletocompressive,whilethevariationofsubstratebiasvoltagehadlittleeffectontheresidualstress.Forthetribologicaltests,theTiNfilmswithcompressiveresidualstressshowedbettertribologicalperformancethanthosewithtensileresidualstress.ThefrictioncoefficientforTiNfilmswithcompressiveresidualstresswasmuchlowerthanthatforTiNfilmswithtensileresidualstress.Meanwhile,thewearrateofTiNfilmsdecreasedwiththedecreaseofresidualstress.TheanalysisofSEMimagesoftheweartrackshowedthatcracksanddelaminationwerecausedbytheinterfacestress,andtheTiNfilmswithcompressiveresidualstressshowedbetteradhesiontothesubstrate.Conclusion:Inconclusion,thestressstatusofTiNthinfilmhasasignificantinfluenceonitstribologicalperformance.TheTiNthinfilmswithcompressiveresidualstressexhibitbettertribologicalbehavior
5thanthosewithtensileresidualstress.Moreover,theinterfacebetweentheTiNfilmandthesubstratewasidentifiedasthecriticalpositionwherecracksanddelaminationoccurred.Therefore,optimizingthedepositionparameterstoobtainTiNfilmswithcompressiveresidualstresswhilereducingtheinterfacestressisaneffectiveapproachtoachievingoptimaltribologicalperformance.Inadditiontothedepositionparametersdiscussedintheexperiment,otherfactorssuchasfilmthickness,substratematerial,anddepositionmethodcanalsoaffecttheresidualstressinTiNthinfilms.Therefore,furtherstudiesneedtobecarriedoutonthesefactorstofullyunderstandtheinfluenceofresidualstressonthetribologicalbehaviorofTiNthinfilms.Moreover,themechanismbywhichcompressiveresidualstressenhancesthetribologicalperformanceofTiNfilmsisstillunderinvestigation.Itissuggestedthatcompressivestressmayinducetheformationofadensermicrostructurewithfewerdefectsanddislocations,leadingtoimprovedmechanicalpropertiesandwear
6resistance.ThefindingsofthisstudyhavepracticalimplicationsforthedesignandoptimizationofTiNthinfilmcoatingsforvariousindustrialapplications.Bycontrollingthedepositionparameterstoachievecompressiveresidualstresswhileminimizingtheinterfacestress,engineerscanimprovethetribologicalperformanceanddurabilityofTiNcoatedpartsandcomponents,resultingincostsavingsandincreasedefficiencyinthemanufacturingprocess.Inadditiontotheoptimizationofdepositionparameters,post-treatmentmethodsmayalsobeemployedtomodifytheresidualstressandimprovethetribologicalperformanceofTiNthinfilms.Onesuchmethodisannealing,whichinvolvesheatingthefilmtoahightemperaturetorelievetheresidualstressandpromotegraingrowth,resultinginimprovedmechanicalpropertiesandwearresistance.Anotherpost-treatmentmethodisionimplantation,whichinvolves
7bombardingthefilmwithionstoinducecompressivestressandimprovehardnessandwearresistance.ThismethodcanalsobeusedtomodifythechemicalcompositionandstructureofTiNthinfilms,furtherenhancingtheirtribologicalproperties.Inadditiontoindustrialapplications,TiNthinfilmsalsofindusesinbiomedicalimplantsanddevices,wheregoodwearresistanceandbiocompatibilityareessential.TheinfluenceofresidualstressonthebiocompatibilityandhemocompatibilityofTiNthinfilmsisanareaofactiveresearch,withstudiesindicatingthatcompressivestresscanenhancecellgrowthandreducethrombusformation.Insummary,thetribologicalperformanceofTiNthinfilmsisstronglyinfluencedbyresidualstress,whichcanbecontrolledandmanipulatedthroughdepositionparametersandpost-treatmentmethods.FutureresearchinthisareawillundoubtedlyuncovernewinsightsintothemechanismsthatunderlietheenhancedtribologicalpropertiesofTiNthinfilms,leadingtothe
8developmentofnewandinnovativesolutionsforawiderangeofindustrialandbiomedicalapplications.AnotherimportantfactorthataffectsthetribologicalperformanceofTiNthinfilmsisthethicknessofthefilm.ResearchhasshownthatthethicknessofTiNthinfilmshasasignificantinfluenceontheirtribologicalproperties,withthinnerfilmsexhibitinghigherhardnessandwearresistance.Moreover,theorientationoftheTiNgrainsalsoplaysaroleindeterminingthetribologicalperformanceofthefilms.Researchhasshownthatfilmswith(111)orientationexhibitthebesttribologicalpropertiesduetotheirhighhardnessandlowfrictioncoefficient.AnotherareaofresearchinthefieldofTiNthinfilmsisthedevelopmentofnewdepositiontechniquesandmaterials,whichcanfurtherenhancetheirtribologicalproperties.Forexample,hybridcoatingsconsistingofmultiplelayers,suchasTiN/TiAlN
9orTiN/CrN,havebeendevelopedtoimprovewearresistanceandreducefrictioninhigh-temperatureapplications.NanocrystallineandamorphousTiNfilmsarealsobeingexploredaspotentialalternativestoconventionalTiNcoatings,astheyexhibitsuperiortribologicalpropertiesduetotheirhighhardnessandlowfrictioncoefficient.Overall,TiNthinfilmshaveshowngreatpotentialforenhancingthetribologicalpropertiesofawiderangeofindustrialandbiomedicalapplications.Continuedresearchinthisfieldwillfurtherimproveourunderstandingoftheunderlyingmechanismsandleadtothedevelopmentofnewandinnovativesolutionstomeettheever-increasingdemandsofmoderntechnology.Yes,that'scorrect.TiNthinfilmshaveawiderangeofpotentialapplicationsinvariousfieldsduetotheirexcellenttribologicalproperties.Ongoingresearchisfocusedonfurtherimprovingthesepropertiesthroughtheoptimizationofdepositiontechniques,
10materialcomposition,andfilmthickness,aswellasthedevelopmentofnewhybridcoatingsandalternativefilmstructures.Theseinnovationswillhelptomeetthegrowingdemandforhigh-performancecoatingsinavarietyofindustrialandbiomedicalapplications.
