SEMI T1-95 SPECIFICATION FOR BACK SURFACE BAR CODE

SEMI T1-95 SPECIFICATION FOR BACK SURFACE BAR CODE

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1、SEMIT1-95N/A©SEMI1993,1996SPECIFICATIONFORBACKSURFACEBARCODEMARKINGOFSILICONWAFERSNOTICE:Theuser'sattentioniscalledtothepossi-3Terminologybilitythatcompliancewiththisspecificationmay3.1background—ofabarcodesymbol—theuni-requireuseofaninventioncoveredbypatent

2、rights.formlighterormorereflectiveregion,includingquietBypublicationofthisspecification,SEMItakesnozones,thatprovidescontrastforthedarkerbars.positionrespectingthevalidityofanypatentrightsassertedinconnectionwithanyitemmentionedinthis3.2bar—inabarcodesymbol—

3、thedarkerorlessspecification.Usersofthisspecificationareexpresslyreflectiveelementofthesymbol.advisedthatdeterminationofanysuchpatentrights,3.3barcodedensity—thenumberofcharacters,andtheriskoftheinfringementofsuchrights,areexclusiveofquietzones,thatcanberepr

4、esentedinaentirelytheirownresponsibility.linearunitofmeasure.1ScopeNOTE:Barcodedensitycanbeexpressedincharac-tersperinch(cpi)orcharacterspermillimeter(cpmm).1.1Thisspecificationdefinesthecontentandlocationofabacksurfacebarcodemarkingforsiliconwafers.3.4barco

5、desymbol—anarrayofrectangularbarsThecodeisvariableinlengthfrom7to18charactersandspacesthatarearrangedinapredeterminedpatternwhichareuser-definable.Acharacterpositionisheldfollowingspecificrulestorepresentelementsofdataconstantforthechecksumcharacter,butallel

6、seisthatarereferredtoascharacters.variable.NootherinformationisencryptedintotheNOTE:Thesymboliscomprisedofmessagecharac-code.Thisallowstheperformancerequirementsoftersandstart/stopcharacters,checkcharacters,andrelatedbarcodereadingequipmenttobesimplified.Inq

7、uietzonesasrequiredbyaparticularsymbologytoaddition,provisionismadeforanoptionalalphanu-formacompletescannableentity.mericmarkingofthesizespecifiedinSEMIM12toenableoperatoridentificationofwafers.Thisalphanu-3.5barcodecharacter—asinglegroupofbarsandmericcodei

8、snotintendedtobemachinereadable.spaceswhichrepresentanindividualnumber,letter,punctuationmark,orothersymbol.1.2Note1:TheexampleasdescribedinTable1andFigure1pertainstoahardmarkappliedbythesilicon

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